EUV Mask Blanks Inspection and Review System
ABICS Series E320
NEW
For high-sensitivity detection of phase defects in next-generation EUV mask blanks and highly accurate capture of defect coordinates
Topics
Features
- Actinic inspection (with 13.5nm EUV light)
- High-sensitivity detection of printable phase defects inside reflective Mo/Si multilayers
- High-sensitivity and high-speed inspection with dark-field optics (40x magnification)
- Highly accurate capture of defect coordinates using high-magnification review (1,500x)
- Defect analysis, including defect classification and determination of false defects, using bright-field and dark-field review
Applications
- Detection of phase defects in the Mo/Si multilayers of next-generation EUV mask blanks
- Review of phase defects in EUV mask blanks
- Highly accurate capture of phase defect coordinates to enable defect mitigation
