Mask Inspection System



Mask inspection system for pellicle-less EUV mask and optical mask inspection in the technology nodes of 7nm, 5nm, and 3nm


  • A mask inspection system designed for inspecting pellicle-less EUV masks and optical masks in the technology nodes of 7nm, 5nm, and 3nm
  • 45nm pixel size, high power 213nm QCW laser (>400mW), and two types of linearly polarized light enabling improved particle detection performance
  • Mask-to-Mask (MtM) inspection mode utilizing a whole mask pattern image saved during the first inspection as reference and monitor mask defects after wafer exposures
  • Compatible with dual pod for EUV reticles, RSP150 and 200 for optical
  • Fully automated inspection linked with overhead hoist transport (OHT)
  • Compact design with power supply and control unit integrated in the main body


  • Quality assurance inspection of pellicle-less EUV masks, incoming inspection of optical masks, and periodic quality assurance inspection of optical masks at wafer fabs
  • Particle inspection during the manufacturing process of EUV masks and outgoing inspection of optical masks at mask shops

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