Automatic Inspection and Review System

OPTELICS AI²

NEW
OPTELICS AI²

Automatic defect inspection, high-magnification review, and 3D surface shape profiling all in a single device.

Topics

Features

  • Automatic defect inspection, high-magnification review, and surface shape profiling of various types of semiconductor wafers, all in a single device that serves the varying needs of customers in their R&D and production processes
  • High-speed inspection capability: inspecting a whole 3-inch wafer in 15 minutes with sub-micron sensitivity
  • High-magnification review capability: high-magnification surface shape profiling available with switching of objective lens
  • Deep learning-based high-precision image classification, patterned sample inspection, and inspection of specific types of defects
  • Defect inspection, high-magnification review, and surface shape profiling of transparent samples, such as compound semiconductors and films, without interference of backside reflection
  • Lasertec providing a complete system including both hardware and software, making customization for specific need, and offering entire system support

Applications

  • High-speed automatic defect inspection of various types of semiconductor wafers
  • Defect review
  • Defect surface shape profiling
  • Defect tracking in production process

Specifications

Inspection time (3" wafer) 15 minutes per wafer
Samples Various types of semiconductor wafers (including, silicon, SiC, GaN, InP, AIN and glass), glass substrates, films, and others
High-speed automatic surface defect inspection Confocal and differential interference contrast optics
High-magnification defect review Confocal optics
Defect shape 3D profiling

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