Mask Blanks Inspection and Review System
MAGICS Series M9650/M9651
Semiconductor mask blank inspection and review system for the cutting-edge technology node of 5nm and beyond
Topics
Features
- Latest model of advanced defect inspection system attaining both high sensitivity for the next-generation high-quality mask blank inspection and high throughput for incoming and outgoing inspection at production facilities
- Introducing new inspection optics and adopting the high-speed inspection circuitry technology of our patterned mask inspection system while using the core technology of MAGICS, de facto standard mask blank inspection tool, as its base
- Achieving significantly higher sensitivity not only for defects on substrates but also for defects on each layer of cutting-edge semiconductor mask blanks, thereby enabling the more stringent qualification of blanks
- Compatible with multi-slot cassettes for blank manufacturers, RSP and MRP for mask shops, and dual pods for EUVL
- M9651 is applicable to line & space monitor pattern inspection and offers an effective tool for various process management needs at mask shops.
Applications
- Inspection of EUV mask blanks, optical mask blanks, and substrates
- Defect review
- Defect sizing
