Mask Blanks Inspection and Review System
MAGICS Series M9750/M9751
NEW
Mask blanks inspection and review system for next-generation leading-edge semiconductors
Topics
Features
- Delivering both high-sensitivity inspection of high-quality mask blanks for next-generation semiconductors and high throughput required for incoming and outgoing inspection at production facilities
- New inspection optics and high-speed inspection circuitry adopted from our patterned mask inspection systems, combined with the core technology of MAGICS, the de facto standard tool
- Significantly enhanced sensitivity to defects on substrates or on various layers of leading-edge mask blanks, enabling stringent qualification of blanks
- Highly accurate defect coordinates enabling defect mitigation during EUV mask manufacturing
- M9751 supports line & space monitor pattern inspection, offering an effective tool for various needs of process management at mask shops
Applications
- Detection of minute defects on EUV mask blanks and substrates
- Instant defect review during inspection, and high-magnification review after inspection
- Sizing of minute defects
- Highly accurate capture of defect coordinates
