Product

Lasertec releases new CLIOS G10 Series FPD Photomask Inspection System for Generation 10.5, and 71PA CM Pellicle Inspection and Pellicle Mounting System for CLIOS

2017.11.24

Lasertec Corporation today announced the release of two new products - CLIOS G10 Series FPD Photomask Inspection System for Generation 10.5, and 71PA CM Pellicle Inspection and Pellicle Mounting System for CLIOS.

For high speed, high sensitivity inspection of Generation 10.5 FPD photomasks

Enabling automated pellicle inspection and mounting in combination with CLIOS for G10.5

Description

CLIOS G10 Series enables the high-sensitivity, high-throughput inspection of Generation 10.5 photomasks used for manufacturing large flat panel displays. 71PA CM is designed for the remote operation of pellicle mounting in various sizes up to Generation 10.5 in a clean environment immediately after the completion of mask inspection.

Recently, manufacturers in the FPD industry have been busy responding to the need for small and medium-sized high-resolution displays used on smartphones and tablets and for large-sized panels of the high-definition 4K and 8K TVs. Mask pattern scaling and panel size enlargement are progressing rapidly. A number of investments continue to be made for building production facilities - for Generation 10.5 liquid crystal displays in China and for organic LED displays in Korea - and, therefore, there is growing demand for FPD photomask inspection systems.

In response to this market need, Lasertec has launched the FPD photomask inspection system for Generation 10.5 and the pellicle inspection and mounting system, thereby contributing to the development and production of high-quality photomasks.

Features

CLIOS G1001

  • Inspection and defect review of photomasks up to Generation 10.5 (2000mm x 1800mm)
  • Sophisticated defect detection algorithm and high-resolution database for high-sensitivity inspection
  • Simultaneous execution of die-to-die and die-to-database inspection (combination mode)
  • 30% shorter inspection time (compared with the conventional model) by introducing a newly designed stage and a high-speed defect detection processing unit
  • Fully-automated processing by SECS/GEM

71PA CM

  • Applicable to pellicles in various sizes up to Generation 10.5
  • Minimizing mask contamination risk by remote operation of pellicles mounting immediately after mask inspection completion
  • Particle inspection function enables the inspection of both surface and backside of pellicles (optional)

Applications

  • Incoming inspection and periodic quality-assurance inspection of large FPD photomasks and pellicles
  • Outgoing inspection of large FPD photomasks and pellicles
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