Pellicle Inspection and Pellicle Mounting System for CLIOS

71PA CM

Features

  • Applicable to pellicles in various sizes up to Generation 10.5
  • Minimizing mask contamination risk by remote operation of pellicle mounting immediately after mask inspection completion
  • Enabling high-precision pellicle positioning by alignment camera
  • Particle inspection function enables the inspection of both surface and backside of pellicles (optional)
  • A pellicle is tentatively mounted on mask and then pressed uniformly with controlled pressure level and pressing time by the pressing machine.

Applications

  • Inspection, auto transfer and mounting of pellicles during FPD photomask manufacturing

Specifications

Applicable pellicle size Multiple pellicle sizes up to G10.5
Inspection time 35 minutes (G10.5 pellicle)
Sensitivity 5µm
Inspection area Whole pellicle excluding the area within 5mm from edge
Dimensions 3,200mm (W) x 4,000mm (D) x 3,700mm (H)
Weight Approximately 1,700kg

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