EUV Mask Blanks Inspection and Review System
ABICS E120
Detecting printable phase defects and enabling defect management for EUV mask blanks
Topics
Features
- Actinic inspection (with the 13.5nm EUV light)
- High-sensitivity detection of printable phase defects inside Mo/Si multilayer
- High-sensitivity and high-speed inspection with dark-field optics
- Highly accurate capturing of defect coordinates with high magnification review
- Defect analysis with bright-field and dark-field reviews
Applications
- EUV mask blank (Mo/Si multilayer) inspection
- EUV mask blank defect analysis
- High-accuracy defect location detection
